CharacteristicProperties of Low-k Thin Film Deposited by Sputtering

스퍼터링에 의한 Low-k 박막의 특성

  • Oh, Teresa (Division of Semiconductor, Choenju University)
  • Received : 2012.04.16
  • Accepted : 2012.07.12
  • Published : 2012.07.31


To obtain available process at low temperature, SiOC thin film was prepared with various flow rates by using the rf magnetron sputtering, and AZO thin film was also deposited on SiOC film by rf magnetron sputtering system. The optical electrical properties of the SiOC film and SiOC/AZO were analyzed by the uv visible spectrometer and PL spectra. SiOC film on n type Si showed various type emission according to the deposition condition. The SiOC film showed the blue shift with increasing the thickness in PL spectra. AZO/SiOC/Si film had a broad emission characteristic, which is enhanced the efficiency in solar cell.


Supported by : 청주대학교


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