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An Investigation on the Dielectric and Microwave Properties of Ag(Ta,Nb)O3 Thick Films on the Alumina Substrates

알루미나 기판에 스크린 프린팅된 Ag(Ta,Nb)O3 후막의 유전특성 및 초고주파 특성에 대한 연구

  • Lee, Ku-Tak (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Koh, Jung-Hyuk (Department of Electronic Materials Engineering, Kwangwoon University)
  • 이규탁 (광운대학교 전자재료공학과) ;
  • 고중혁 (광운대학교 전자재료공학과)
  • Received : 2011.09.15
  • Accepted : 2011.09.27
  • Published : 2011.11.01

Abstract

Perovskite niobates and tantalates have been placed on a short list of functional materials for future technologies. This article was investigated ferroelectric materials $Ag(Ta,Nb)O_3$ thick film. In this study, we have fabricated the $Ag(Ta,Nb)O_3$ thick film on the $Al_2O_3$ substrates by screen printing method. The $Ag(Ta,Nb)O_3$ thick film were fabricated by the mixed oxide method. The sintering temperature and time were 1,150$^{\circ}C$, 2 hr. The electrical properties of $Ag(Ta,Nb)O_3$ thick film were investigated at 30~100$^{\circ}C$.

Acknowledgement

Supported by : 한국에너지 기술평가원(KETEP)

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