Determining an Optimal Low Temperature Polycrystalline Silicon Crystallization Technology of LCD using Patent Map and AHP

특허맵과 AHP를 활용한 최적의 LCD 저온폴리실리콘 결정화 기술 선정

  • 김관열 (한국기술교육대학교 대학원 기술경영학과) ;
  • 이장희 (한국기술교육대학교 산업경영학부)
  • Received : 2010.10.13
  • Accepted : 2011.03.13
  • Published : 2011.03.01


Many LCD manufacturers continue to develop the technologies of LCD manufacturing processes for the reduction of production cost, power consumption and high-resolution. The LTPS (Low Temperature Polycrystalline Silicon) crystallization technology is important for rearranging the internal structure of liquid crystal grain by adding certain energy to amorphous silicon and turning it into poly-silicon in order to manufacture LCD with better performance. We consider 14 existing technologies of LTPS crystallization in the LCD manufacturing and present an intelligent analysis methodology using patent map and AHP (Analytic Hierarchy Process) analysis for determining an optimal LTPS crystallization technology. By using patent map analysis, we easily understand the development process and mega-trend of LTPS crystallization technologies and their relationship. By using AHP analysis, we evaluate 14 LTPS technologies. Through the use of proposed methodology, we determine the Continuous Wave Laser Lateral Crystallization technology as an optimal one.