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A Study on the Analysis of Multi-beam Energy for High Resolution with Maskless Lithography System Using DMD

DMD를 이용한 마스크리스 리소그래피 시스템의 고해상도 구현을 위한 다중 빔 에너지 분석에 관한 연구

  • Received : 2010.10.19
  • Accepted : 2011.02.10
  • Published : 2011.02.28

Abstract

Exposure process is the most important technology to fabricate highly integrated circuit. Up to now, mask type lithography process has been generally used. However, it is not efficient for small quantity and/or frequently changing products. Therefore, maskless lithography technology is raised in exposure process. In this study, relations between multi-beam energy and overlay were analyzed. Exposure experiment of generating pattern was performed. It was from presented scan line by multi- beam simulation. As a result, optimal scan line distance was proposed by simulation, and micro pattern accuracy could be improved by exposure experiment using laser direct imaging system.

Keywords

Maskless lithography;DMD(Digital Micromirror Device);Multi beam simulation

Acknowledgement

Supported by : 한국산업기술진흥원

References

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