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A Study of the Dielectric Properties of the Silver-Tantalate-Niobate Thick Films

Silver-Tantalate-Niobate Thick Film의 유전 특성 연구

  • Lee, Ku-Tak (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Yun, Seok-Woo (Department of Electronic Materials Engineering, Kwangwoon University) ;
  • Kang, Ey-Goo (Department of Photovoltaic Engineering, Far East University) ;
  • Koh, Jung-Hyuk (Department of Electronic Materials Engineering, Kwangwoon University)
  • 이규탁 (광운대학교 전자재료공학과) ;
  • 윤석우 (광운대학교 전자재료공학과) ;
  • 강이구 (극동대학교 태양광공학과) ;
  • 고중혁 (광운대학교 전자재료공학과)
  • Received : 2010.05.13
  • Accepted : 2010.06.22
  • Published : 2010.07.01

Abstract

Low loss perovskite niobates and tantalates have been placed on a short list of functional materials for future technologies. In this study, we fabricated Ag(Ta,Nb)$O_3$ thick films on the $Al_2O_3$ substrates by the screen printing method. The Ag(Ta,Nb)$O_3$ powders were fabricated by the mixed oxide method. The sintering temperature and time were $1150^{\circ}C$ and 2 hrs, respectively. The results of XRD analysis showed that the specimens employed in this study had the pesudo cubic structure. The dielectric permittivity and loss tangent of the films have been characterized from 1 kHz to 1 MHz. Also the dielectric permittivity and loss tangent were measured from 303 K to 393 K. The electrical properties of the film are also discussed.

Acknowledgement

Supported by : 기초전력연구원

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