Large-area Uniform Deposition of Amorphous Hydrogenated Carbon Films using a Plasma CVD Method

플라즈마 CVD 법을 이용한 대면적 균일한 비정질 탄소 막 증착

  • 윤상민 (전북대학교 전기공학과) ;
  • 양성채 (전북대학교 전기공학과)
  • Published : 2009.05.01


It has been investigated for the film uniformity and deposition rate of a-C:H films on glass substrate and polymeric materials in the presence of the modulated crossed magnetic field. We used Plasma CVD, i.e, using a crossed electromagnetic field, for uniform depositing thin film. The optimum discharge condition has been discussed for the gas pressure, the magnetic flux density and the distance between substrate and electrodes, As a result, it is found that the optimum discharge conditions are $CH_4$ concentration $CH_4$=10 %, modulated magnetic flux density B=48 Gauss, pressure P=100 mTorr, discharge power supply voltage V=l kV under these experimental conditions. By using these experimental condition, it is possible to prepare the most uniform film extends over about 160 mm of the film width. In this study, we deposited a-C:H thin film on glass substrate, and have a plan that using this condition, study depositing a-C:H thin film on polymeric substrate in next studies.


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