Properties of the Various Power Ratio in GZOB/AU Multilayers

전력비 변화에 따른 Au Multilayer 위에 증착한 GZOB 박막의 특성

  • 이종환 (성균관대학교 정보통신공학부) ;
  • 유현규 (성균관대학교 정보통신공학부) ;
  • 이규일 (성균관대학교 정보통신공학부) ;
  • 이태용 (성균관대학교 정보통신공학부) ;
  • 강현일 (성균관대학교 정보통신공학부) ;
  • 김응권 (특허청 정보통신 심사국) ;
  • 송준태 (성균관대학교 정보통신공학부)
  • Published : 2008.11.01


We investigated the effects of power ratio on the electrical and optical properties of Au based Ga-, B- codoped ZnO(GZOB) thin films. GZOB thin films were deposited on Au based poly carbonate(PC) substrate with various power in the range from 60 to 120 W by DC magnetron sputtering. In the result, GZOB films at 100 W exhibited a low resistivity value of $1.12\times10^{-3}\Omega-cm$, and a visible transmission of 80 % with a thickness of 300 nm. This result indicated that the addition of Ga and B in ZnO films leads to the improvement of conductivity and transparent. From the result, we can confirm the possibility of the application as transparent conductive electrodes.


  1. H. L. Hartnagel, A. L. Dawar, A. K. Jain, and C. Jagadish, "Semiconducting Transparent Thin Films", Institute of Physics Publishing, Bristol and Philadelphia, PA, p. 152, 1995
  2. C. M. Hou, K. K. Huang, Z. M. Gao, X. S. Li, S. H. Feng, Y. T. Zhang, and G. T. Du, "Structural and optical properties of ZnO films with different thicknesses grown on sapphire by MOCVD", Chem. Res. Chinese U., Vol. 22, No. 5, p. 552, 2006
  3. D. R. Sahu, S. Y. Lin, and J. L. Huang, "ZnO/Ag/ZnO multilayer films for the application of a very low resistance transparent electrode", Appleed Surface Science, Vol. 252, p. 7509, 2006
  4. T. Minami, H. Nanto, H. Sato, and S. Takata, "Effect of applied external magnetic field on the relationship between the arrangement of the substrate and the resistivity of aluminium-doped ZnO thin films prepared by R.F. magnetron sputtering", Thin Solid Films, Vol. 164, p. 275. 1988
  5. F.-J. Haug, Z. Geller, H. Zogg, and A. N. Tiwari, "Influence of deposition conditions on the thermal stability of ZnO:Al films grown by rf magnetron sputtering", Sci. Technol. A, Vol. 19, p. 171, 2001
  6. M. Chen, Z. L. pei, C. Sun, J. Gong, R. F. Huang, and L. S. Wen, "ZAO: an attractive potential substitute for ITO in flat display panels", Mat. Sci. Eng. B, Vol. 85, p. 212, 2001
  7. A. K. Abduev, A. K. Akhmedov, and A. S. Asvarov, "The structural and electrical properties of Ga-doped ZnO and Ga, B- codoped ZnO thin films: The effects of additional boron impurity", Energy Material and Solar Cells, Vol. 91, p. 258, 2007
  8. E. Bertran, C. Corbella, M. Vives, A. pinyol, C. Person, and I. Porqueras, "RF sputtering deposition of Ag/ITO coatings at room temperature", Solid State Ionics, Vol. 165, p. 139, 2003
  9. D. R. Sahu, S. Y. Lin, and J. L. Huang, "Study on the electrical and optical properties of Ag/Al-doped ZnO coatings deposited by electron beam evaporation", Applied Surface Science, Vol. 253, p. 4886, 2007
  10. T. Yamada, A. Miyake, S. Kishimoto, and H. Makino, "Effects of substrate temperature on crystallinity and electrical properties of Ga-doped ZnO films prepared on glass substrate by ion-plating method using DC arc discharge", Surface & Coatings Technology, Vol. 202, p. 973, 2007
  11. M. Ohring, "The Materials Science of Thin Films", Academic Press, p. 195, 1992
  12. 김봉석, 이규일, 강현일, 이태용, 오수영, 이종환, 송준태, "다층박막을 이용한 Ga-doped ZnO 투명 전도막의 특성", 전기전자재료학회논문지, 20권, 12호, p. 1044, 2007
  13. F. K. Shan and Y. S. Yu, "Band gap energy of pure and Al doped ZnO thin films", J. Eur. ceram. Soc., Vol. 24, No. 6, p. 1869, 2004
  14. K. Prabakar, C. Kim, and C. Lee, "UV, violet and blue-green luminescence from RF sputter deposited ZnO:Al thin films", Cryst. Res. Technol., Vol. 40, p. 1150, 2005

Cited by

  1. The Characteristics of GZOB Thin Film on O2Plasma Treated Polymer Substrate vol.22, pp.8, 2009,