Characteristic Properties of TiN Thin Films Prepared by DC Magnetron Sputtering Method for Hard Coatings

Hard Coating 응용을 위한 DC 마그네트론 스퍼터링 방법을 이용하여 증착한 TiN 박막의 특성에 대한 연구

  • 김영렬 (성균관대학교 정보통신공학부) ;
  • 박용섭 (성균관대학교 정보통신공학부) ;
  • 최원석 (한밭대학교 전기공학부) ;
  • 홍병유 (성균관대학교 정보통신공학부)
  • Published : 2008.07.01


Titanium nitride (TiN) thin films are widely used for hard coatings due to their superior hardness, chemical stability, low friction and good adhesion properties. In this study, we investigated the effect of DC power on the characteristics of TiN thin films deposited on Si and glass substrates by DC magnetron sputtering using TiN target. We made TiN films of 300 nm thickness with various DC powers. The structural properties of films are investigated by x-ray diffractions (XRD) and tribological properties are measured by nano-indentation, nano-scratch tester. The rms roughness was measured by atomic forced microscopy (AFM). In the result, TiN films had the smooth surface and exhibited (111) directions with the increase of DC Power. Also, especially in case of 175 W DC power, TiN film exhibited the maximum hardness about 8 GPa, and the critical load near 25.


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