Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Design and Characteristics of Anti-reflection Coating using Multi-layer Thin Film on the Ferrule Facet

다층 박막을 이용한 패럴 단면의 무반사 코팅 설계 및 특성

  • 기현철 (한국광기술원 광응용연구사업부 광소자팀) ;
  • 양명학 (한국광기술원 광응용연구사업부 광소자팀) ;
  • 김선훈 (한국광기술원 광응용연구사업부 광소자팀) ;
  • 김태언 (한국광기술원 광응용연구사업부 광소자팀) ;
  • 김회종 (한국광기술원 광응용연구사업부 광소자팀) ;
  • 구할본 (전남대학교 전기공학과)
  • Published : 2007.11.01

Abstract

In this paper, we have designed the anti-reflection(AR) coating for $1400{\sim}1600$ nm wavelength range on the ferrule facet of optical connector. The low-temperature ion-assisted deposition was applied to AR coating on the ferrule facet in order to avoid damage of optical connector. We have measured the refractive index of coating film($Ta_2O_5\;and\;SiO_2$) using the ellipsometer and optimized the film thickness using the SEM and thickness measurement equipment. UV-VIS-NIR spectrophotometer is used to measure transmissivity of the AR coated ferrule facet. The refractive index of $Ta_2O_5\;and\;SiO_2$ is $2.123{\sim}2.125$ and $1.44{\sim}1.442$, respectively, for $1400{\sim}1600$ nm wavelength range. The transmissivity of the AR coated ferule facet is more than 99.8 % for $1425{\sim}1575$ nm wavelength range and more than 99.5 % for $1400{\sim}1600$ nm wavelength range. The return loss of the AR coated ferrule facet is 30.1 dB.

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References

  1. P. J. Martin and R. P. Netterlield, 'Optical films produced by ion-based techniques', in Progress in Optics XXIII, E. Wolfd Ed., 1986
  2. M. Lottiaux, 'Comparison of the properties of titanium dioxide films prepared by various techniques', Thin Solid Films, Vol. 179, p. 107, 1989
  3. P. G. Pai, 'Infrared spectroscopic study of SiOx films produced by plasma enhanced chemical vapor deposition', Appl. Opt., Vol. 28, p. 5545, 1996
  4. U. J. Gibson, 'Ion-beam method for optical thin films', Physics of Thin film, Vol. 13, 1987
  5. P. J. Martin, 'Ion-based methods for optical thin film deposition', J. Mat. Sci., Vol. 21 p. 1, 1986 https://doi.org/10.1007/BF01144693
  6. K. H. Mueller, 'Model for ion-assisted thin film densification', J. Appl. Phys., Vol. 59, p. 2803, 1986 https://doi.org/10.1063/1.336960
  7. Y. Fujiwara, N. Toyoda, K. Mochiji, T. Mitamura, and I. yamada, Nuclear Instrument and methods in Physics Research Section B: 'Beam interactions with materials and atoms', Vol. 206, p. 870, 2003 https://doi.org/10.1016/S0168-583X(03)00881-4