두께에 따른 비정질 칼코게나이드 $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ 박막의 홀로그래피 데이터 격자형성

• 여철호 (광운대학교 공대 전자재료공학과) ;
• 정홍배 (광운대학교 공대 전자재료공학과)
• Published : 2006.08.01

Abstract

The Ag photodoping effect in amorphous $As_{40}Ge_{10}Se_{15}S_{35}$ chalcogenide thin films for holographic recording has been investigated using a He-Ne laser (${\lambda}$=632.8 nm). The chalcogenide films thickness prepared in the present work were thinner in comparison with the penetration depth of recording light ($d_p=1.66{\mu}m$). It exhibits a tendency of the variation of the diffraction efficiency (${\eta}$) in amorphous chalcogende films, independently of the Ag photodoping. That is, ${\eta}$ increases rapidly at the beginning of the recording process and reaches the maximum (${\eta}_{max}$) and slowly decreases slowly with the exposed time. In addition, the value of ${\eta}_{max}$ depends strongly on chalcogenide film thickness(d) and its maximum peak among the films with d = 40, 80, 150, 300, and 633 nm is observed 0.083% at d = 150 nm (approximately 1/2 ${\Delta}n$), where ${\Delta}$n is the refractive index of chalcogenide thin film (${\Delta}n=2.0$). The ${\eta}$ is largely enhanced by Ag photodoping into the chakogenides. In particular, the value of ${\eta}_{max}$ in a bilayer of 10-nm-thick Ag/150-nm-thick $As_{40}Ge_{10}Se_{15}S_{35}$ film is about 1.6%, which corresponds to ${\sim}20$ times larger than that of the single-layer $As_{40}Ge_{10}Se_{15}S_{35}$ thin film (without Ag). And we obtained the diffraction pattern according to the formation of (P:P) polarization holographic grating using Mask pattern and SLM.

References

1. S. J. Jang, C. H. Yeo, J. I. Park, H. Y. Lee, and H. B. Chung, 'The photoinduced anisotropy(PA) by Ag polarized-photodoping in amorphous chalcogenide thin films', KIEEME, Vol. 13(6), pp. 533-537, 2000
2. T. Todorov, N. Tomova and L. Nikolova, 'High sensitivity material with reversible photoinduced anisotropy', Opt. Commun, Vol. 47, pp. 123-127, 1983 https://doi.org/10.1016/0030-4018(83)90099-8
3. C. H. Yeo, S. J. Jang, J. I. Park, H. Y. Lee, and H. B. Chung, 'The measurement on diffraction efficiency in polarization holography using amorphous chalcogenide thin films', KIEEME., Vol. 12, pp. 1192-1197, 1999
4. L. Nikolova, T. Tbdorov, M. Ivanov, F. Andruzzi, S. Hvilsted, and P. S. Ramanujam, 'Polarization holographic gratings in side-chain azobenzene polyesters with linear and circular photoanisotropy', Appl. Opt., Vol. 35(20), pp. 3835-3840, 1996 https://doi.org/10.1364/AO.35.003835
5. H. Fritzsche, 'The origin of photo-induced optical anisotropies in chalcogenide glasses', J Non-Cryst, Solids, Vol. 164-166, pp. 1169-1172 1993 https://doi.org/10.1016/0022-3093(93)91207-J
6. H. Y. Lee, J. K. Kim and H. B. Chung, 'On Ag-doping in amorphous Sb2S3 thin film by He-Ne and He-Cd laser exposures and its optical characteristics', J. Non-Cryst. Solid, Vol. 279, pp. 209-214, 2001 https://doi.org/10.1016/S0022-3093(00)00415-4
7. H. B. Chung, H. Y. Lee, S. H. Park, J Y. Chun, 'Structural and optical properties of obliquely deposited amorphous As40Ge10Se15S35 thin films as an anisotropic materials' The International conference on electrical engineering (ICEE'98), Vol. 2, pp. 927-930, July 21-25, 1998
8. H. Fritzsche, 'Toward understanding the photoinduced change in chalcogenide glasses' , Semiconductors, Vol. 32, No.8, pp .850-854, 1998 https://doi.org/10.1134/1.1187471
9. H. Y. Lee, M. S. Kim, and H. B. Chung, 'The analysis of Ag doping mechanism by photo-exposure' J. of KIEEME., Vol. 8, No.4, pp. 472-477, 2000
10. H. B. Chung, H. Y. Lee, and S. H. Park, 'Vectoral photo-induced effects in amorphous (Se, S)-based thin film' Proceedings of the 3rd Pacific Rim International Conference on Advanced Materials and Processing, (PRICM-3), Vol. 2, pp. 2701-2706, 1998
11. J. Teteris, 'Holographic recording in amorphous chalcogenide thin films', Current Opinions in Solid state & Material Science. Vol. 7. pp. 127-134. 2003 https://doi.org/10.1016/S1359-0286(03)00042-1
12. C. Poga, P. M. Lundquist, V. Lee, R. M. Shelby, R. J. Twieg, and D. M. Burland, 'Polysiloxane-based photorefractive polymers for digital holographic data . storage' Appl. Phys. Lett. Vol. 69, No. 19, pp. 1047-1049, 1996 https://doi.org/10.1063/1.116926