A Study on Improved Pore Uniformity of Nano Template using the Rapid Thermal Anneal

급속열처리를 통한 알루미나 나노 템플레이트의 기공 균일도 개선에 관한 연구

  • 김동희 (충주대학교 전자공학과) ;
  • 김진광 (충주대학교 전자공학과) ;
  • 권오대 (충주대학교 전자공학과) ;
  • 양계준 (충주대학교 전자공학과) ;
  • 이재형 (군산대학교 전자정보공학부) ;
  • 임동건 (충주대학교 전자공학과)
  • Published : 2006.02.01


Ordered nanostructure materials have received attention due to their unique physical properties and potential applications in electronics, mechanics and optical devices. To actualize most of the proposed applications, it is quite important to obtain highly ordered nanostructure arrays. The well-aligned nanostructure can be achieved by synthesizing nanostructure material in the highly ordered template. To get well-aligned pore array and reduce process time, rapid thermal anneal by an IR lamp was employed in vacuum state at $500^{\circ}C$ for 2 hour. The pore array is comparable to a template annealed in vacuum furnace at $500^{\circ}C$ for 30 hours. The well-fabricated AAO template has the mean pore diameter of 70 nm, the barrier layer thickness of 25 nm, the pore depth of $9{\mu}m$, and the pore density of higher than $1.2{\times}10^{10}cm^{-2}$.



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