DOI QR코드

DOI QR Code

Micro Structure and Surface Characteristics of NiCr Thin films Prepared by DC Magnetron Sputter according to Annealing Conditions

DC 마그네트론 스퍼터링 NiCr 박막의 열처리 조건에 따른 미세구조 및 표면특성

  • 권용 (조선대학교 신소재공학과) ;
  • 김남훈 (조선대학교 에너지자원신기술연구소) ;
  • 최동유 (조선대학교 에너지자원신기술연구소) ;
  • 이우선 (조선대학교 전기공학과) ;
  • 서용진 (대불대학교 전기전자공학과) ;
  • 박진성 (조선대학교 신소재공학과)
  • Published : 2005.06.01

Abstract

Ni/Cr thin film is very interesting material as thin film resistors, filaments, and humidity sensors because their relatively large resistivity, more resistant to oxidation and a low temperature coefficient of resistance (TCR). These interesting properties of Ni/Cr thin films are dependent upon the preparation conditions including the deposition environment and subsequent annealing treatments. Ni/Cr thin films of 250 nm were deposited by DC magnetron sputtering on $Al_2O_3/Si$ substrate with 2-inch Ni/Cr (80/20) alloy target at room temperature for 45 minutes. Annealing treatments were performed at $400^{\circ}C,\;500^{\circ}C,\;and\;600^{\circ}C$ for 6 hours in air or $H_2$ ambient, respectively. The clear crystal boundaries without crystal growth and the densification were accomplished when the pores were disappeared in air ambient. Most of surface was oxidic including NiO, $Ni_2O_3$ and $Cr_xO_y$(x=1,2, y=2,3) after annealing in air ambient. The crystal growth in $H_2$ ambient was formed and stabilized by combination with each other due to the suppression of oxidized substance on film surface. Most oxidic Ni was restored when the oxidic Cr was present due to its stability in high-temperature $H_2$ ambient.

References

  1. A. Banovec and A. Zalar, 'Investigation of sliding contact resistance of Ni-Cr/Au and Ni-Cr/Au-$SiO_2$ thin resistive films', Thin Solid Films, Vol. 164, p. 129, 1988
  2. A. Peled, J. Farhadyan, Y. Zloof, and V. Baranauskas, 'The midrange and high temperature dependence of vacuum deposited NiCr thin film resistors', Vacuum, Vol. 45, No.1, p. 5, 1994
  3. E.-M. Lee and S.-G. Yoon, 'The structural and electrical properties of NiCr alloy for the bottom electrode of high dielectric $(Ba,Sr)TiO_3$ (BST) thin films', Trans. EEM, Vol. 4, No.1, p. 15, 2003
  4. C. L. Au, M. A. Jackson, and W. A. Anderson, 'Structural and electrical properties of stable Ni!Cr thin films', J. Electron. Mater., Vol. 16, No.4, p. 301, 1987
  5. G. Nocerino and K. E. Singer, 'Resistance stabilization of Ni-Cr films by surface oxide formation', J. Vac. Sci. Technol. B, Vol. 16, No.2, p. 147, 1979
  6. S. Hofmann and A. Zalar, 'Correlation between electrical properties and AES concentration-depth profiles of NiCr thin films', Thin Solid Films, Vol. 39, p. 219, 1976
  7. G. B. Hoflund and. W. S. Epling, 'Oxidation study of a polucystalline Ni/Cr alloy I: room-temperature exposure to $O_2$', Thin Solid Films, Vol. 307, No. 1-2, p. 126, 1997 https://doi.org/10.1016/S0040-6090(97)00251-4
  8. J. Steffen and S. Hofmann, 'Use of factor analysis with O KLL Auger spectra to distinguish chemisorption and oxide formation on Ni', Surf. Sci., Vol. 202, No.3, p. L607, 1988
  9. S. P. Jeng, P. H. Holloway, and C. D. Batich, 'Surface passivation of Ni/Cr alloy at room temperature', Surf. Sci., Vol. 227, No.3, p. 278, 1990
  10. S. P. Jeng, P. H. Holloway, D. A. Asbury, and G. B. Hoflund, 'Changes induced at Ni/Cr alloy surfaces by annealing and oxygen exposure', Surf. Sci., Vol. 235, No. 2-3, p, 175, 1990
  11. W. Brucker and S. Baunack, 'Electrical resistance and mechanical stress in Nicr/Cu/NiCr thin films', J. of Appl, Phys., Vol. 85, No.2, p. 935, 1999
  12. 윤석범, 'DC 스퍼터링 증착에 의한 Al 전극을 갖는 전계발광소자 제작', 전기전자재료학회논문지 , 13권,5호, p. 376, 2000
  13. R. M. German, 'Sintering Theory and Practice', John Wiley & Sons, Inc., p. 73, 1996
  14. R. M. German, 'Sintering Theory and Practice', John Wiley & Sons, Inc., p. 198, 1996
  15. 김남훈, 권광호, 김창일, 장의구, '자장 강화 반응성 이온 식각 장비를 이용한 몰리브덴 박막의 식각 특성 연구', 전기전자재료학회논문지, 13권, 1호, p. 6, 2000
  16. 권 용, 박용주, 최승평, 정 진, 최광표, 류현욱, 박진성, 'Thermal evaporation법으로 제조한 NiCr 박막의 증착 특성', 한국세라믹학회지, 41권,6호, p. 450, 2004
  17. 김병희, '이화학사전', 한국사전연구사, p. 573, 1995
  18. W. S. Epling, C. K. Mount, and G. B. Hoflund, 'Study of a polycrystallinc Ni/Cr alloy V. hydrogen-atom exposure', Thin Solid Films, Vol. 304, No. 1-2, p. 273, 1997 https://doi.org/10.1016/S0040-6090(96)09557-0