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Anodization Process of the YBa2Cu3O7-x Strip Lines by the Conductive Atomic Force Microscope Tip

전도성 AFM 탐침에 의한 YBa2Cu3O7-x 스트립 라인의 산화피막 형성

  • 고석철 (전북대학교 전자정보공학부) ;
  • 강형곤 (전북대학교 기초과학연구) ;
  • 임성훈 (전북대학교 부설공학연구원 공업기술연구센) ;
  • 한병성 (전북대학교 전자정보공학) ;
  • 이해성 (한국기초과학지원연구원 전주분소)
  • Published : 2004.08.01

Abstract

Fundamental results obtained from an atomic force microscope (AFM) chemically-induced direct nano-lithography process are presented, which is regarded as a simple method for fabrication nm-scale devices such as superconducting flux flow transistors (SFFTs) and single electron tunneling transistors (SETs). Si cantilevers with Pt coating and with 30 nm thick TiO coating were used as conducting AFM tips in this study. We observed the surfaces of superconducting strip lines modified by AFM anodization' process. First, superconducting strip lines with scan size 2 ${\mu}{\textrm}{m}$${\times}$2 ${\mu}{\textrm}{m}$ have been anodized by AFM technology. The surface roughness was increased with the number of AFM scanning, The roughness variation was higher in case of the AFM tip with a positive voltage than with a negative voltage in respect of the strip surface. Second, we have patterned nm-scale oxide lines on ${YBa}-2{Cu}_3{O}_{7-x}$ superconducting microstrip surfaces by AFM conductive cantilever with a negative bias voltage. The ${YBa}-2{Cu}_3{O}_{7-x}$ oxide lines could be patterned by anodization technique. This research showed that the critical characteristics of superconducting thin films were be controlled by AFM anodization process technique. The AFM technique was expected to be used as a promising anodization technique for fabrication of an SFFT with nano-channel.

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