Analysis of the Critical Characteristics in the Superconducting Strip Lines by ICP Etching System

ICP 식각 시스템에 의한 초전도 스트립 라인의 임계 특성 분석

  • 고석철 (전북대학교 전자정보공학부) ;
  • 강형곤 (전북대학교 기초과학연구) ;
  • 최효상 (조선대학교 전기공학) ;
  • 양성채 (전북대학교 전자정보공학) ;
  • 한병성 (전북대학교 전자정보공학부)
  • Published : 2004.07.01


Superconducting flux flow transistor (SFFT) is based on a control of the Abrikosov vortex flowing along a channel. The induced voltage by moving of the Abrikosov vortex in an SFFT is greatly affected by the thickness, the width, and the length of channel. In order to fabricate a reproducible channel in the SFFT, we studied the variation of the critical characteristics of ${YBa}_2{Cu}_3{O}_7-\delta(YBCO)$ thin films with the etching time using ICP (Inductively coupled plasma) system. From the simulation, it was certified that the vortex velocity was increased in a low pinning energy at channel width 0,5 mm. The surfaces of YBCO thin film were etched by ICP etching system. We observed the etched channel surfaces by AFM (Atomic Force Microscope) and measured the critical current density with etching time. As a measured results, the etching thickness of channel should be optimized to fabricated a flux flow transistor with specified characteristics.


  1. J. Appl. Phys. v.65 no.10 Sparameter measurements on single superconducting thin film three-terminal devices made of high-Ts materials J.S.Martens;G.K.GHohenwarter;J.B.Beyer;J.E.Nordman;D.S.Ginley
  2. J. Appl. Phys. v.82 no.10 Current-Voltage characterization of the vortex motion in YBa₂Cu₃$O_{7-δ}$ microbridges and implocations on the development of wuperconducting flux flow transistor P.Bernstein;C.Picard;M.Pannetier;Ph. Lecoeur;J.F.Hamet;T.D.Doan;J.P.Contour;M.Drouet;F.C.Reg
  3. IEEE Trans. Appl. Supercon. v.1 no.2 A Model and equivalent circuit for a superconducting flux flow transistor J.S.Martens;D.S.Ginley;J.B.Beyer
  4. Electrochemical and Solid-state Lett. v.4 no.10 High density plasma etching of Y-Ba-Cu-O superconductors Y.H.Im;H.G.Kang;B.S.Han;Y.B.Hahn
  5. 전기전재재료학회논문지 v.14 no.2 새로운 ICP 장치를 이용한 고온 초전도체의 Dry Etching과 기존의 Wet Etching 기술과의 비교 강형곤;임성훈;임연호;한윤봉;황종선;한병성
  6. Appl. Phys. Lett. v.55 no.25 Wet chemical etching of high-temperature superconducting Y-Ba-Cu-O films in ethylenediaminetraacetic acid F.K.Schokoohi;L.M.Schiavone;C.T.Rogers;A.Inam;X.D.Wu;L.Nazar;T.Venkatesan
  7. Matt. Sci. Eng. B v.102 Conditions of ICP for a superconducting flux flow transistor and its etching characteristics Hyeong Gon Kang;Sung Hun Lim;Byoung Sung Han;Hyo Sang Choi;Yoon Bong Hahn
  8. 전기전재재료학회논문지 v.16 no.5 플라즈마 식각을 이용한 초전도 자속 흐름 트랜지스터 제작 강형곤;임성훈;고석천;한윤봉;한병성
  9. 전기전재재료학회논문지 v.16 no.10 다채널 고온 초전도 볼텍스 유동 트랜지스터의 I-V 특성 해석 고석철;강형곤;임성훈;최효상;한병성
  10. Processing of the IEEE v.85 no.4 STM/AFM nano-oxidation process to room temperature operated single electron transistor and other devices K.Matsumoto