Electromagnetic Field Distribution of Electrodeless Fluorescent Lamps

무전극 형광램프의 페라이트 특성변화에 따른 전자계 분포

  • 김광수 (원광대학교 전자재료공학과) ;
  • 이영환 (원광대학교 전자재료공학과) ;
  • 조주웅 (원광대학교 전자재료공학과) ;
  • 최용성 (원광대학교 전기전자 및 정보공학부) ;
  • 박대희 (원광대학교 전기전자 및 정보공학부)
  • Published : 2004.02.01

Abstract

The RF inductive discharge or inductively coupled plasma (ICP) continues to attract growing attention as an effective plasma source in many industrial applications, the best known of which are plasma processing and lighting technicology. Although most practical ICP operate at 13.56 [MHz]and 2.65 [MHz], the trend to reduce the operating frequency is clearly recognizable from recent ICP developments. In an electrodeless fluorescent lamp, the use of a lower operating frequency simplifies and reduces cost of rf matching systems and rf generators and can eliminate capacitive coupling between the inductor coil and plasma, which could be a strong factor in wall erosion and plasma contamination. In this study, the configuration of ferrite and fixture which operates at the frequency of 2.65[MHz]was discussed as functions of the ferrite thickness and distance by using the electromagnetic simulation software (Maxwell 2D).

Keywords

Inductively Coupled Plasma (ICP);Electron density

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