The Deposition and Properties of Surface Textured ZnO:Al Films

표면 텍스쳐된 ZnO:Al 투명전도막 증착 및 특성

  • 유진수 (성균관대학 정보통신공학부) ;
  • 이정철 (한국에너지기술연구원) ;
  • 김석기 (한국에너지기술연구원) ;
  • 윤경훈 (한국에너지기술연구원) ;
  • 박이준 (한국에너지기술연구원) ;
  • 이준신 (성균관대학 정보통신공학부)
  • Published : 2003.09.01


Transparent conductive oxides (TCO) are necessary as front electrode for most thin film solar cell. In our paper, transparent conducting aluminum-doped Zinc oxide films (ZnO:Al) were prepared by rf magnetron sputtering on glass (Corning 1737) substrate as a variation of the deposition condition. After deposition, the smooth ZnO:Al films were etched in diluted HCI (0.5%) to examine the electrical and surface morphology properties as a variation of the time. The most important deposition condition of surface-textured ZnO films by chemical etching is the processing pressure md the substrate temperature. In low pressures (0.9mTorr) and high substrate temperatures ($\leq$$300^{\circ}C$), the surface morphology of films exhibits a more dense and compact film structure with effective light-trapping to apply the silicon thin film solar cells.


TCO(transparent conductive oxide);ZnO:Al;Thin film solar cells;Light trapping;rf magnetron sputtering


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