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Dry Etching of patternedLiNbO3Waveguides for the High-speed Optical Modulator fabrication

초고속 광변조기 제작을 위한 LiNbO3도파로의 건식식각

  • 양우석 (전자부품연구원 광부품연구센터) ;
  • 김우경 (전자부품연구원 광부품연구센터) ;
  • 이승태 (단국대학교 전자공학과) ;
  • 박우정 (성균관대학교 신소재공학과) ;
  • 장현수 (성균관대학교 정보통신공학부) ;
  • 윤대호 (성균관대학교 신소재공학과) ;
  • 이한영 (전자부품연구원 광부품연구센터)
  • Published : 2003.08.01

Abstract

Ti-indiffused LiNbO$_3$waveguide have been used to various high speed optical device based on electro-optic effect such as modulators, switches, and sensor, etc. In order to high speed modulation of optical modulator have, one of the further devices, needed to increasing of electrode surrounding air by LiNbO$_3$dry etching because of impedance matching for optical and RF phase velocity between waveguide and electrode. We studied property of LiNbO$_3$dry etching after waveguide patterning lot optical modulation by using neutral loop discharge (NLD) plasma.

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