Fabrication Technology for Improving Pattern Quality in Two-Dimensional Photonic Crystal Structure

2차원 광결정 제작에 패턴 특성을 향상시키기 위한 공정 기술

  • 김해성 (동국대학교 밀리미터파 신기술 연구 센터) ;
  • 신동훈 (동국대학교 밀리미터파 신기술 연구 센터) ;
  • 김순구 (동국대학교 밀리미터파 신기술 연구 센터) ;
  • 이진구 (동국대학교 밀리미터파 신기술 연구 센터) ;
  • 이범석 ((주)LG 전자 기술원) ;
  • 김혜원 ((주)LG 전자 기술원) ;
  • 이재은 ((주)LG 전자 기술원) ;
  • 한영수 ((주)LG 전자 기술원) ;
  • 최영호 ((주)LG 전자 기술원)
  • Published : 2003.06.01


There are now many theoretical investigations and real manufactures for numerous applications of photonic crystals (PCs) associated with photonic band gap and photonic integrated circuits. However, there are some difficulties to design and fabricate the desired pattern quality. It is not easy to satisfy accurate critical dimension (CD) for patterns with arbitrary shapes and pitch sizes aligned in various directions. In this work, we report the optimum conditions to better fabricate and design, and greatly improve pattern quality in delineating two-dimensional (2D) PCs in the nanometer range using single- step e-beam lithography system with conventional exposure mode.


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