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Effect of Annealing on Carbon Nitride Films Prepared by High Voltage Discharge Plasma

고전압 방전 플라즈마에 의해 합성한 질화탄소 박막의 열처리 효과

  • 김종일 (한국기술교육대학교 정보기술공학부 BK교수)
  • Published : 2002.05.01

Abstract

I have investigated the effects of annealing on a polymeric $\alpha-C_3N_{4.2}$ at high pressure and temperature in the presence of seeds of crystalline carbon nitride films prepared by a high voltage discharge plasma. The samples were evaluated by x-ray photoelectron spectroscopy (XPS), infrared spectroscopy, Auger electron spectroscopy and x-ray diffraction(XRD). Notably, XPS studies of the film composition before and after annealing demonstrate that the nitrogen composition in $\alpha-C_3N_{4.2}$ material initially containing more than 58% nitrogen decreases during the annealing process and reaches a common, stable composition of ~43%. XPS analysis also shows that the nitrogen composition in the annealed films without polymeric $\alpha-C_3N_{4.2}$ was reduced from 35% to 17%. Furthermore the concentration of the sp$^3$bonded phase increased with the increment of the annealing temperature.

References

  1. Preparation of crystalline carbon nitride thin film and bulk sample J. I. Kim
  2. Mendeleev Commun v.6 no.10 Synthesis of crystalline carbon nitride K. P. Burdina;N. B. Zorov;O. V. Kravchenko;Y. Y. Kuzyakov;J. I. Kim;S. A. Kulinich
  3. 전기전자재료학회논문지 v.14 no.10 결정질 질화탄소 박막의 합성과 그 특성해석 김종일;배선기
  4. 전기전자재료학회논문지 v.15 no.2 질화탄소 박막 증착시 고전압 방전 플라즈마에 가한 자장의 영향 김종일;배선기 https://doi.org/10.4313/JKEM.2002.15.2.184
  5. J. Vac. Sci. Technol. v.A13 Ionized magnetron sputter deposition of amorphous carbon nitride thin films D. Li;S. Lopez;Y. W. Chung;M. S. Wong;W. D. Sproul
  6. Jpn. J. Appl. Phys. v.32 no.10A Structural properties of amorphous carbon nitride films prepared by reactive RF-magnetron sputtering N. Nakayama;Y. Tsuchiya;S. Tamada;K. Kosuge;S. Nagada;K. Takahiro;S. Yamaguchi https://doi.org/10.1143/JJAP.32.L1465
  7. 전기전자재료학회논문지 v.15 no.2 반응성 스퍼터링으로 성장된 결정성 질화탄소막의 기계적 특성 이성필;강종봉 https://doi.org/10.4313/JKEM.2002.15.2.147
  8. Phys. Rev. Lett v.73 no.1 Carbon nitride deposited using energetic species: A tow-phase system D. Marton;K. J. Boyd;A. H. Al-Bayati;S. S. Todorov;J. W. Ravalais https://doi.org/10.1103/PhysRevLett.73.118
  9. J. Phys: Conden. Matt v.6 Carbon nitride films synthesized by NH₃-ion-beam-assisted H. W. Song;F. Z. Cui;X. M. He;W. Z. Li;H. D. Li https://doi.org/10.1088/0953-8984/6/31/011
  10. Mendeleev Commun. A Polymeric Material with a Symm Heptazine Monomer Produced by Thermal Decomposition of Mercuric Rhodanide S. I. Kudryashov;O. V. Kravchenko;G. M. Khafizova;K. P. Burdina;N. B. Zorov
  11. 대한민국 특허, 출원번호 10-2000-0009242 레이저 애블레이션법과 고전압 방전 플라즈마 CVD법의 혼합방식에 의한 다이아몬드 박막 제조 및 고온고압 조건하에서의 다이아몬드 벌크의 형성 방법 김종일
  12. Chemistry and Industry Carbon nitride solids: potential alternatives to diamond? C. M. Lieber;Z. J. Zhang
  13. Appl. Phys. Lett. v.66 no.20 Reactive pulsed laser deposition of CNx films X. A. Zhao;C. W. Ong;Y. C. Tsang;Y. W. Wong;C. L. Choy https://doi.org/10.1063/1.113114
  14. Appl. Phys. Lett. v.66 no.26 Growth and composition of covalent carbon nitride solids Z. J. Zhang;S. Fan;C. M. Lieber https://doi.org/10.1063/1.113794
  15. Chem. Phys. Lett. v.247 Stoichiometric growth of polycrystalline C₃N₄thin films Y. Li;Z. Zhang;S. Xie;G. Yang https://doi.org/10.1016/0009-2614(95)01209-7
  16. Thin Solid Films v.303 Si-containing crystalline carbon nitride derived from microwave plasma enhanced chemical vapor deposition L. C. Chen;D. M. Bhusan;C. Y. Yang;K. H. Chen;T. J. Chuang;M. C. Lin;C. K. Chen;Y. F. Huang https://doi.org/10.1016/S0040-6090(97)00041-2
  17. Mat. Res. Soc. Symp. Proc. v.388 Growth and properties of carbon nitride thin films Z. J. Zhang;P. Yang;C. M. Lieber
  18. Science in China v.41 no.4 Synthesis of C₃N₄crystals under high pressure and high temperature D. He;F. Zhang;X. Zhang;M. Zhang;R. Liu;Y. Xu;W. Wang https://doi.org/10.1007/BF02879032
  19. Science v.271 Low compressibity carbon nitride D. M. Teter;R. J. Hemley https://doi.org/10.1126/science.271.5245.53