한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)
- Volume 14 Issue 10
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- Pages.792-795
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- 2001
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- 1226-7945(pISSN)
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- 2288-3258(eISSN)
초록
we present a electrical transport(resistivity, Hall effect) measurements in varying temperature ranges between 78K and 300K on HoSi
파일
참고문헌
- Silicides for VLSI Applications S. P. Murarka
- Journal of Alloys and compounds v.219 Phase diagram of the holmium-silicon binary system and physical properties of holium silicides up to 1050℃ V. N. Eremenko;V. E. Listovnichii;S. P. Luzan;Y. I. Buyanov;P. S. Martsenyuk
- Journal of Alloys and compounds v.247 Standard enthalpies of formation of some carbide, silicides, germanides and borides of holmium by high temperature direct synthesis calorimetry S. V. Meschel;O. J. Kleppa
- Binary Alloy Phase Diagrams T. B. Massalski;H. Okamoto;P. R. Subramanian;L. Kacprzak
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Thin Solid Films
v.318
Formation of expitaxial HoSi₂Layer on Si(100)
G. Pet
$\"{o}$ ;G. L. Molnar;Z. E. Horv$\'{a}$ th;E. Zsoldos;N. Q. Khanh;J. Gyula;J. Kansk - 半導體工學 林基祚
- 物質の電氣的 性質 橋口隆吉