Adhesion Characteristics of Diamond Thin Film on WC-Co Substrate

초경합금상에 합성된 다이아몬드 박막의 부착력 특성

  • 이상희 (한국생산기술연구원 플라즈마응용사업단) ;
  • 박상현 (경남대학교 전기공학과) ;
  • 이덕출 (인하대학교 전기공학과)
  • Published : 2001.07.01


Diamond thin films were synthesized on WC-Co substrate by RF PACVD(radio frequency plasma-assisted chemical vapor deposition) technique with H$_2$-CH$_4$-O$_2$ gas mixture. WC-Co substrate was pre-treated in HNO$_3$solution, scratched with 3$\mu\textrm{m}$ diamond paste and exposed in the O$_2$ plasma before deposition. The diamond thin film prepared at 11% oxygen concentration showed the best quality of good adhesion and wear resistance at various oxygen concentration with the fixed 5% CH$_4$ concentration.


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