Adhesion Characteristics of Diamond Thin Film on WC-Co Substrate

초경합금상에 합성된 다이아몬드 박막의 부착력 특성

  • 이상희 (한국생산기술연구원 플라즈마응용사업단) ;
  • 박상현 (경남대학교 전기공학과) ;
  • 이덕출 (인하대학교 전기공학과)
  • Published : 2001.07.01

Abstract

Diamond thin films were synthesized on WC-Co substrate by RF PACVD(radio frequency plasma-assisted chemical vapor deposition) technique with H$_2$-CH$_4$-O$_2$ gas mixture. WC-Co substrate was pre-treated in HNO$_3$solution, scratched with 3$\mu\textrm{m}$ diamond paste and exposed in the O$_2$ plasma before deposition. The diamond thin film prepared at 11% oxygen concentration showed the best quality of good adhesion and wear resistance at various oxygen concentration with the fixed 5% CH$_4$ concentration.

References

  1. 전기전자재료학회논문지 v.11 no.7 RF 플라즈마 CVD법에 의한 다이아몬드 박막의 합성 이상희;이덕출
  2. Diamond and Related Materials v.10 Fabrication and application of chemical vapor deposition diamond-coated drawing dies Z. M. Zhang;H. S. Shen;F. H. Sun;Z. C. He;Y. Z. Wan
  3. Handbook of Industrial Diamonds and Diamond Films M. A. Prelas;G. Popovici;L. K. Bigelow
  4. Surface and Coatings Technology v.135 Diamond coating on tungsten carbide and their erosive wear properties S. Amirhaghi;H. S. Reehal;R. J. K. Wood;D. W. Wheeler
  5. Cemented Carbide P. Schwarzkopf;R. Kieffer
  6. Thin Solid Films v.377-378 Comparison between acid leaching and siliciding pre-treatments on the erosive wear performance of diamond coating on cemented carbides substrates D. P. Dowling;K. Donnelly;R. V. Flood;M. McConnell;G. Morgan