A Study on the Fabrication $Na_0.5$$K_0.5$$NbO_3$ Volatile Material Thin Film by Pulsed Laser Deposition and he Confirmation of C-axis Orientation by X-ray Diffraction

PLD 기법에 의한 $Na_0.5$$K_0.5$$NbO_3$ 휘발성 물질의 박막 제작 및 XRD에 의한 c축 배향성 확인에 관한 연구

  • 최원석 (고려대학교 전기공학과) ;
  • 김장용 (고려대학교 전기공학과) ;
  • 장철순 (고려대학교 전기공학과) ;
  • 문병무 (고려대학교 전기공학과)
  • Published : 2001.04.01

Abstract

W fabricated thin film using Na$_{0.5}$K$_{0.5}$NbO$_3$ volatile material by pulsed laser deposition (PLD) and studied characterization from EM, XRD, P-E. The density and scale of droplet, which is the defect of PLD, was investigated by SEM but large droplet was not found. The degree of assemble oriented C-axis measured with X-ray diffraction suggests that this film oriented C-axis achieved by $\theta$-2$\theta$ scan and rocking curves shows good self-assemble phenomenon, finally $\phi$-scan does that all of the four directions of the lattice in film equals to those of substrate. P-E hysteresis loop shows residual remnant polarization or saturation polarization value, but it is applicable to memories.ies.

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