Li2O and Li2CO3 Thin Film Growth by LPMOCVD

LPMOCVD에 의한 Li2O 및 Li2CO3 박막의 증착

  • Jung, Sang-Chul (Department of Environmental Engineering, Sunchon National University) ;
  • Ahn, Ho-Geun (Department of Chemical Engineering, Sunchon National University) ;
  • Imaishi, Nobuyuki (Institute of Advanced Material Study, Kyushu University)
  • Received : 1998.08.21
  • Accepted : 1998.11.17
  • Published : 1999.04.10


Low pressure metal organic chemical vapor deposition (LPMOCVD) of $Li_2O$ solid thin films from Li(DPM) in nitrogen-oxygen or argon-oxygen atmosphere was experimentally investigated by using a small hot wall tubular type reactor. XRD and ESCA analysis revealed that $Li_2CO_3$ film grew in nitrogen-oxygen atmosphere and $Li_2O$ grew in argon-oxygen atmosphere. The grown lithium oxide or carbonate reacted with silicon or silica base materials to produce silicates. The CVD model analysis by means of the well-known micro trench method and Monte Carlo simulation was not fully successful, but a set of data on gas phase reaction rate constant and surface reaction constant was obtained.


$Li_2O$;CVD;Reaction Rate Constant;Sticking Coefficient;Monte Calro Method


  1. Mat. Res. Bull. v.10 B. J. Curtis;H. R. Brunner
  2. Nippon Kagaku Kaishi v.7 T. Takagi;I. Kobayashi;K. Tominaga;M. Okada
  3. Jpn. J. Appl. Phys. v.34 S. C. Jung;N. Imaishi;H. C. Park
  4. J. Chem. Eng. S. C. Jung;N. Imaishi
  5. Kagaku Kogaku Ronbunshu v.21 S. C. Jung;N. Imaishi;H. C. Park
  6. Kagaku Kogaku Ronbunshu v.15 T. Inagaki;H. Komiyama
  7. Kagaku Kogaku Ronbunshu v.16 T. Sato;N. Imaishi
  8. J. Cryst. Growth v.147 Y. Akiyama;T. Sato;N. Imaishi
  9. Appl. Phys. Lett. v.62 A. A. Wrnberg;H. J. Gysling;A. J. Filo;T. N. Blanton
  10. Mat. Res. Soc. Symp. Proc. v.335 R. Hiskes;S. A. Dicarolis;J. Fouquet;Z. Lu;R. S. Feigelson;R. K. Route;F. Leplingard;C. M. Foster
  11. Kagaku Kogaku Ronbunshu v.21 S. C. Jung;N. Imaishi;H. C. Park.