Li2O and Li2CO3 Thin Film Growth by LPMOCVD

LPMOCVD에 의한 Li2O 및 Li2CO3 박막의 증착

  • Jung, Sang-Chul (Department of Environmental Engineering, Sunchon National University) ;
  • Ahn, Ho-Geun (Department of Chemical Engineering, Sunchon National University) ;
  • Imaishi, Nobuyuki (Institute of Advanced Material Study, Kyushu University)
  • Received : 1998.08.21
  • Accepted : 1998.11.17
  • Published : 1999.04.10

Abstract

Low pressure metal organic chemical vapor deposition (LPMOCVD) of $Li_2O$ solid thin films from Li(DPM) in nitrogen-oxygen or argon-oxygen atmosphere was experimentally investigated by using a small hot wall tubular type reactor. XRD and ESCA analysis revealed that $Li_2CO_3$ film grew in nitrogen-oxygen atmosphere and $Li_2O$ grew in argon-oxygen atmosphere. The grown lithium oxide or carbonate reacted with silicon or silica base materials to produce silicates. The CVD model analysis by means of the well-known micro trench method and Monte Carlo simulation was not fully successful, but a set of data on gas phase reaction rate constant and surface reaction constant was obtained.

Keywords

$Li_2O$;CVD;Reaction Rate Constant;Sticking Coefficient;Monte Calro Method

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