Studies on 1,2-Naphthoquinone-(2)diazide-5-sulfonic Acid Ester Derivatives for Pre-sensitized Offset Plates

PS 판용 1,2-Naphthoquinone-(2)diazide-5-sulfonic Acid Ester Derivatives의 합성 및 응용

  • Ku, Yang Seo (Department of Chemical Science and Technology, Agency for Technology & Standards) ;
  • Myung, Young Chan (Department of Chemical Science and Technology, Agency for Technology & Standards) ;
  • Ahn, Chong Il (Department of Chemical Science and Technology, Agency for Technology & Standards) ;
  • Kim, Sun Ho (Department of Chemical Science and Technology, Agency for Technology & Standards)
  • 구양서 (산업자원부 기술표준원 유기화학과) ;
  • 명영찬 (산업자원부 기술표준원 유기화학과) ;
  • 안종일 (산업자원부 기술표준원 유기화학과) ;
  • 김선호 (산업자원부 기술표준원 유기화학과)
  • Received : 1999.08.09
  • Accepted : 1999.11.30
  • Published : 1999.12.10

Abstract

2-Diazo-1-naphthoquinone-5-sulfonyl chloride(NQD-Cl) was synthesized from sodium 2-diazo-naphthoquinone-5-sulfonate by chlorination. NQD-Cl was esterified with hydroxybenzophenones to give several 1,2-naphthoquinone-(2)-diazide-5-sulfonic acid ester derivatives(NQD-esters). We have compared benzophenone derivatives with methoxy group to benzophenone derivatives with hydroxy group. Solubility of each NQD-ester was studied. Each of NQD-esters was formulated with novolac base resin and PS plates were manufactured. Photosensitivity, bleachability, compatible exposed time and relative sensitivity were determined by UV spectrophotometry, imaged by UV lithographic techniques, and the gray scale method. According to the number of substituted NQD group, it showed that relative sensitivity was different from gray scale method. NQD-esters with methoxy group showed a good solubility and higher sensitivity than commercial PS ones.

Keywords

1, 2-naphthoquinone-(2)diazide-5-sulfonic acid esters;methoxy group;solubility;PS plates;photosensitivity

References

  1. 반도체 v.12 유희열
  2. 한국인쇄학회지 v.12 권태선;황석환;김성훈
  3. 電氣化學 v.64
  4. Macromolecules v.29 H. Shih;A. Reiser
  5. USP. 3,201,239 W. Neugebaure
  6. J. Photochemistry and Photobiology v.114 A. D. Geishina;A. V. Vannikov
  7. Polymer Engineering and Science v.23 G. Willson;R. Miller
  8. 반도체 v.2 안광덕
  9. J. Imaging Science and Technology v.42 A. Reiser
  10. 화학세계 v.34 박이순;김성주
  11. Polymer v.36 A. Mochizukiand;T. Teranishi
  12. Photoreactive Polymers A. Reiser
  13. J. Korean Ind. Eng. Chem. v.1 주소영;홍성일