A study on the high selective oxide etching using magnetized helical resonator plasma source

자화된 헬리칼 공진기 플라즈마 소스를 이용한 고선택비 산화막 식각에 관한 연구

  • 이수부 (인하대 공대 전자·전기·컴퓨터공학과부 석사) ;
  • 임승완 (인하대 공대 전자·전기·컴퓨터공학과부) ;
  • 이석현 (인하대 공대 전자·전기·컴퓨터공학과부)
  • Published : 1999.05.01

Abstract

The magnetized helical resonator plasma etcher has been built. Electron density and temperature were measured as functions of rf source power, axial magnetic field, and pressure. The results show electron density increases as the magnetic field increases and reached $2\times1012cm^{-3}$,/TEX>. The oxide etch rate and selectivity to polysilicon were investigated as the above mentioned conditions and self-bias voltage. We can obtain the much improved oxide etch selectivity to polysilicon (60 : 1) by applying the external axial weak magnetic field in magnetized helical resonator plasma etcher.

Keywords

high density plasma;helical resonator plasma;oxide etch;magnetized plasma

References

  1. Jpn. J. Appl. Phys. v.32 S. Samukawa;S. Furuoya
  2. 정기총회 및 추계학술대회 논문집 헬리칼 공진기 플라즈마의 기판플라즈마밀도에 미치는 축방향자계의 영향 김태현;김문영;장상훈;태홍식
  3. Meas. Sci. Techonol. v.2 Simple method to calculate the operating frequency of a helical resonator-RF discharge tube configuration R F Welton;E W Thomas;R K Reeney;T F Moran
  4. Handbook of Plasma Processing Technoloy Stephan M. Rossnagel
  5. Plasma Etching in Semiconductor Fabrication Russ A. Morgan
  6. Principles of Plasma Discharges and Materials Processing M. A. Lieberman;A. J. Litchenberg
  7. High Density Plasma Sources Oleg A. Popov
  8. 전기전자재료학회논문지 v.11 no.4 유도결합형 플라즈마원을 이용한 고선택비 산화막 식각에 관한 연구 이수부;박헌건;이석현
  9. Memo. UCB/ERL M 90/10 Theory of a helical resonator plasma M. A. Lieberman;A. J. Lichtenberg;D. L. Flamm
  10. Cold Plasma in Materials Fabrication Alfred Grill
  11. Rev. Sci. instrum. v.65 no.9 Dual mode operation of a helical resonator discharge P. Bletzinger
  12. Plasma Sources Sci. Technol. v.3 Operation of a helical resonator plasma source M. A. Lieberman;A. J. Lichtenberg;D. L. Flamm
  13. J. Vac. Sci. Technol. v.B14 no.4 Comparison of advanced plasma sources for etching applications. V. Polysilicon etching rate, unformity, profile control, and bulk plasma properties in a helical resonator plasma source J. T. C. Lee;N. Layadi;K. V. Guinn;H. L. Maynard;F. P. Klemens;D. E. ibbotson;I. Tepermeister
  14. Principles of Plasma Discharges and Materials Processing M. A. Lieberman;A. J. Litchenberg
  15. 박사 학위논문, 서울대학교 자화 유도 결합 플라즈마의 건식 식각 특성에 관한 연구 이호준