Fabrication and Characterization of$(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ Thin Films by Pulsed Laser Deposition

펄스 레이저 증착법에 의한 $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ 박막의 제작 및 특성

  • Shim, Kyung-Suk (Dept.of Electric Engineering, Engineering College, Yonsel University) ;
  • Lee, Sang-Yeol (Dept. of Electrical Eng., Yonsei University)
  • Published : 1999.05.01

Abstract

Dielectric thin films of PLT(28) ($(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$) have been deposited on $Pt/Ti/SiO_2/Si$ substrates in situ by a laser ablation. We have systematically changed the laser fluence from 0.4 J/$cm^2$ to 3 J/$cm^2$, and deposition temperature from $450^{\circ}C\; to\; 700^{\circ}C$. The surface morphology was changed from planar grain structure to columnar structure as the nucleation energy was increased. The PLT thin film with columnar structure showed good dielectric properties. The deposition temperature influenced on nucleation energy much stronger than the laser energy density did.

Keywords

laser ablation;$(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$;laser energy density;deposition temperature;surface morphology

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