Decomposition Process of CFC by Thermal Plasma

열플라즈마에 의한 CFC의 분해공정

  • 차우병 (인하대학교 공과대학 화학공학과) ;
  • 최경수 (인하대학교 공과대학 화학공학과) ;
  • 박동화 (인하대학교 공과대학 화학공학과)
  • Received : 1998.04.07
  • Accepted : 1998.07.20
  • Published : 1998.11.10

Abstract

Concerned with environmental issue, a new decomposition method for CFCs that caused the destruction of ozone layer was proposed. Using thermal plasma process, CFC113 decomposed completely. In order to quantify the tendency in decomposition and recombination of CFC113, thermodynamic equilibrium calculations were performed. The calculation was conducted with CFC113, $H_2$, $O_2$ at 1 atm and 300 K~5000 K. In the experiment, products which are generated after decomposition in the plasma were examined by varying reacting gases($H_2$, $O_2$) flow rates and the changes of inside diameters of quenching tubes. Decomposition products were analyzed using Gas Chromatograph. The results are very promising with a decomposition efficiency greater than 99.99%. As to CFC113/$H_2$=1/3, conversion to CO decreased with increasing $O_2$ ratio. When CFC113/$O_2$=1/1, 1/1.5 and 1/2, conversion to CO increases above $H_2$ ratio of 3. The change of CO conversion is not sensitive to power changes. As total flow rate increased, CO conversion was slightly decreased. When the inside diameter of the quenching tube was changed from 8mm into 4mm, CO conversion was increased due to enhanced quenching rate.

Acknowledgement

Supported by : 한국과학재단

References

  1. 公害と對策 v.26 村松久史
  2. J. Geo. Res. v.90 Ramanathan V.;Cierone R. J.;Singh H. B.;Kiehl J. T.
  3. C&EN no.9 Joseph Haggin
  4. 化學裝置 v.32 水野光一
  5. 公害と對策 v.25 新階 央
  6. 公害と對策 v.26 新階 央
  7. 公害と對策 v.26 水野光一
  8. Plasma Chemistry & Plasma Processing v.13 Honda Takuya and Kanzawa Atsushi Sekiguchi Hidetoshi
  9. 大氣汚染學會 v.29 若林孟茂;水野光一;大內日出夫
  10. 電學志 v.114 楣家治
  11. 化學工學論文集 v.19 關口秀俊;神澤淳
  12. Ind. End. Eng. Chem. Process Des. Develop. v.10 Sundstrom D. W.;DeMichell R. L.
  13. AIChE v.4 Joseph F. Skrivan;Woldemar Von Jaskowsky
  14. Journal of Ind. & Eng. Chemistry v.3 Sang-Heug Yun;Geon-Joong Kim;Dong-Wha Park
  15. Metall. Trans. v.21 G. Eriksson;K. Hack
  16. IEEE TRANAACTIONS ON PLASMA SCIENCE v.25 Pierre Fauchais;Armelle Cardelle