Preparation of YBaCuO System Superconducting Thin Films on Si(111) substrates by Chemical Vapor Deposition

CVD법에 의한 Si(111) 기판에 YBaCuO계 초전도 박막의 제조

  • Yang, Suk-Woo (Department of Chemical Engineering, Chonbuk National University) ;
  • Kim, Young-Soon (Department of Chemical Engineering, Chonbuk National University) ;
  • Shin, Hyung-Shik (Department of Chemical Engineering, Chonbuk National University)
  • 양석우 (전북대학교 화학공학과) ;
  • 김영순 (전북대학교 화학공학과) ;
  • 신형식 (전북대학교 화학공학과)
  • Received : 1997.01.28
  • Accepted : 1997.07.18
  • Published : 1997.08.10

Abstract

Superconducting $YBa_2Cu_3O_y$ thin films were prepared at the deposition temperature of $650^{\circ}C$ under oxygen partial pressure of 0.0126 Torr on Si(111) and SrTiO3(100) substrates by chemical vapor deposition technique using $\beta$-diketonates of Y, Ba and Cu as source materials. The thin film fabricated on $SrTiO_3(100)$ had a $T_{c,onset}$ of 91K and $T_{c.0}$ of 87K. The thin film prepared on Si(111) had a $T_{c,onset}$ of 91K but didn't have a $T_{c.0}$ at liquid nitrogen boiling point(77.3K). Dense and two-dimensionally well alligned microstructure was developed for the film deposited on $SrTiO_3(100)$ substrate whereas a relatively porous and randomly distributed microstructure was developed for the film prepared on Si(111) substrate.

Keywords

Acknowledgement

Supported by : 교육부

References

  1. Appl. Phys. Lett. v.53 T. Venkatesan;E. W. Chase;X. D. Wu;A. Inam;C. C. Chang;F. K. Shokoohi
  2. Appl. Phys. Lett. v.52 R. M. Silver;A. B. Berezin;M. Wendman;A. L. de Lozanne
  3. Appl. Phys. Lett. v.53 G. Koren;E. Polturak;B. Fisher;D. Cohen;G. Kimel
  4. Appl. Phys. Lett. v.52 A. D. Berry;D. K. Gaskill;R. T.Holm;E. J. Cukauskas;R. Kaplan;R. L. Henry
  5. J. inorg. nucl. Chem. v.29 K. J. Eisentraut;R. E. Sievers
  6. Analytical. Chemistry v.42 J. E. Schwarberg;R. E. Sievers;R. W. Moshier
  7. J. inorg. nucl. Chem. v.35 R. Belcher;K. Blessel;T. Cardwell;M. Pravica;W. I. Stephen;P. C. Uden
  8. Supercond. Sci. Technol. v.3 A Mogro-Campero
  9. J. Appl. Phys. v.75 F. C. Wellstood;J. J. Kingston;John Clarke
  10. Physica C v.162-164 R. H. Hammond;R. Bormann
  11. Thin Solid Films v.182 K. Kanehori;N. Sughii;T. Fukazawa;K. Miyauchi
  12. Jpn. J. Appl. Phys. v.30 H. Yamane;M. Hasei;H. Kurosawa;T. Hirai
  13. Korean Applied Physics v.3 G. H. Kim;D. S. Park;Y. B. Kwon;D. Y. Kim;S. M. Jeong