Characteristics of Poly(methylphenyl)silane Photoreists

Poly(methylpheny) Silane Photoresist의 특성

  • Kang, Doo-Whan (Dept. of Polymer Science & Engineering, Dankook University) ;
  • Chung, Nak-Jin (Dept. of Polymer Science & Engineering, Dankook University)
  • 강두환 (단국대학교 공과대학 고분자공학과) ;
  • 정낙진 (단국대학교 공과대학 고분자공학과)
  • Received : 1990.11.29
  • Published : 1990.12.31

Abstract

Polymethylphenylsilane(PMPS) was synthesized with methylphenyldichlorosilane using metal sodium. Various sample coated on quartz plate were exposed and the yield of residual film was calculated. To obtain the fine image forming after developing and drying, optical transmittance characterization have to be considered. Exposure is described by three optical parameters X, Y, and Z. There parameters are normally determined from optical transmittance measurements of exposed PMPS films. Z parameter was determined from the initial slope of a transmittance according to exposure time. This set of function parameters provided a complete description of photoresist exposure and development and became the basis for the theoretical process models.

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