Synthesis and Characterization of Photosensitive Naphthoquinonediazide-sulfonyl Derivatives

나프토 퀴논 디아지드 유도체의 합성 및 그 감광 특성

  • Joo, So-Young (Depart. of Textile Engineering, Seoul National University) ;
  • Hong, Sung-Il (Depart. of Textile Engineering, Seoul National University)
  • 주소영 (서울대학교 공과대학 섬유공학과) ;
  • 홍성일 (서울대학교 공과대학 섬유공학과)
  • Received : 1990.11.22
  • Published : 1990.12.31

Abstract

Synthesis and characterization of photosensitive orthonaphthoquinonediazide-sulfonyl derivatives were studied. These photoactive compounds underwent a UV induced transformation to the base-soluble photoproduct. The photoresists were prepared using these photoactive compounds with low molecular weight m-cresol novolacs as matrix resin. And photosensitive characteristics of the photoresists were studied. 3, 4, 5-Trihydroxy-benzophenone with bulky resonance structure increased the sensitivity and the solubility rate of the exposed region. The mixture of PAC and matrix resin having 3:8 weight ratio had the moderate rate of dissolution in the developer. The photoresist using these conditions showed the best snsitivity and contrast under the fixed conditions.

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