- Volume 1 Issue 2
Synthesis and Characterization of Photosensitive Naphthoquinonediazide-sulfonyl Derivatives
나프토 퀴논 디아지드 유도체의 합성 및 그 감광 특성
- Joo, So-Young (Depart. of Textile Engineering, Seoul National University) ;
- Hong, Sung-Il (Depart. of Textile Engineering, Seoul National University)
- Received : 1990.11.22
- Published : 1990.12.31
Synthesis and characterization of photosensitive orthonaphthoquinonediazide-sulfonyl derivatives were studied. These photoactive compounds underwent a UV induced transformation to the base-soluble photoproduct. The photoresists were prepared using these photoactive compounds with low molecular weight m-cresol novolacs as matrix resin. And photosensitive characteristics of the photoresists were studied. 3, 4, 5-Trihydroxy-benzophenone with bulky resonance structure increased the sensitivity and the solubility rate of the exposed region. The mixture of PAC and matrix resin having 3:8 weight ratio had the moderate rate of dissolution in the developer. The photoresist using these conditions showed the best snsitivity and contrast under the fixed conditions.