최적 반복 학습 제어기법을 이용한 RTP의 웨이퍼 온도균일제어

Control of Wafer Temperature Uniformity in Rapid Thermal Processing using an Optimal Iterative teaming Control Technique

  • 발행 : 2000.10.01

초록

An iterative learning control technique based on a linear quadratic optimal criterion is proposed for temperature uniformity control of a silicon wafer in rapid thermal processing.

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