Solid Particle Erosion of CVD Diamond

CVD 다이아몬드 코팅의 고체입자 Erosion 특성

  • 김종훈 (고려대학교 재료공학과) ;
  • 임대순 (고려대학교 재료공학과)
  • Published : 1997.04.01

Abstract

Microwave Plasma assisted CVD (Chemical Vapor Deposition) and DC Plasma CVD were used to prepare thin and thick diamond film, respectively. Diamond coated silicon nitride and fiee standing diamond thick film were eroded by silicon carbide particles. The velocity of the solid particle was about 220m/sec. Phase transformation and the other crack formation were investigated by using Raman spectroscopy and microscopy.